Overview
The Notre Dame Nanofabrication Facility (NDNF) is a 9,000 sq ft Class 100/1000 teaching and research cleanroom in Stinson-Remick Hall of Engineering, University of Notre Dame, South Bend, Indiana. Capabilities: e-beam and optical lithography, deposition (metal, dielectric, semiconductor films), dry and wet chemical etching, and metrology. Materials include silicon, compound semiconductors, zinc selenide nanowires, carbon nanotubes, graphene, and organic polymers. Serves faculty, students, other universities, and industry customers. Key facility details include: The facility is situated at Stinson-Remick Hall, Notre Dame, IN 46556, USA. It focuses on MEMS, Compound Semiconductor on 200mm wafers.
Technology
About University of Notre Dame
The University of Notre Dame is a US Catholic research university founded 1842 in South Bend, Indiana. The Notre Dame Nanofabrication Facility (NDNF) is a 9,000 sq ft Class 100/1000 cleanroom in Stinson-Remick Hall offering e-beam and optical lithography, thin-film deposition, and dry/wet etching for silicon, compound semiconductors, and nanomaterials. Serves Notre Dame faculty and students as well as external academic and industry users.