MIMOS Berhad - 1
Overview
MIMOS Semiconductor Technology Centre Fab 1 is Malaysia's first IC wafer fab, commissioned in 1996 at Technology Park Malaysia, Bukit Jalil. Operates 6-inch (150mm) wafers at 1.0 micron digital CMOS technology with a capacity of approximately 600 wafers per month. Used for R&D and small-volume prototype production. Preceded Fab 2 (200mm) and continues to support legacy process development. Key facility details include: The facility is situated at Technology Park Malaysia, Bukit Jalil, 57000 Kuala Lumpur, Malaysia. It focuses on Logic / Foundry and 1000 process nodes on 150mm wafers. This site represents a production capacity of 600 wafers per month. Production at this facility commenced in 1997.
MIMOS Berhad
MIMOS Berhad is Malaysia's national applied ICT and semiconductor R&D centre, established 1985. Its semiconductor division operated Malaysia's first IC fab from 1996.
Facility Phases
Technology
About MIMOS Berhad
MIMOS Berhad is Malaysia's national applied ICT and semiconductor R&D centre, established in 1985. Its semiconductor division (formerly MySem) operates Malaysia's first IC fab (Fab 1, 150mm, 1996) and a 200mm Fab 2, producing CMOS, Power MOSFET, Schottky, BiCMOS, and MEMS/NEMS devices and providing foundry services from Technology Park Malaysia, Bukit Jalil, Kuala Lumpur.