Politecnico di Milano
Overview
PoliFab is Politecnico di Milano's micro and nanotechnology cleanroom facility on the main Milan campus. Comprises 330m² ISO 6 and 290m² ISO 8 cleanroom space plus a 210m² extension inaugurated with STMicroelectronics in December 2021. Processes substrates from small pieces up to 8-inch (200mm) wafers across silicon, glass, plastic, and other materials. Capabilities: optical and e-beam lithography, wet/dry etching, thin-film deposition, MEMS processing, power electronics, and galvanic isolation R&D. Serves as an open foundry for academic and industrial users. Website: polifab.polimi.it Key facility details include: The facility is situated at Politecnico di Milano, Via Giuseppe Ponzio 34, 20133 Milan, Italy. It focuses on MEMS on 200mm wafers. Production at this facility commenced in 2013.
Politecnico di Milano
Politecnico di Milano operates two semiconductor cleanroom facilities: PoliFab on the main Milan campus and L-NESS at the Como campus.
Facility Phases
Technology
About Politecnico di Milano
Politecnico di Milano is Italy's largest technical university, founded 1863. Operates two semiconductor cleanroom facilities: PoliFab (330m² ISO 6 + 290m² ISO 8, main Milan campus, up to 200mm wafers) and L-NESS (Class 1000 epitaxial nanostructure cleanroom, Como campus). PoliFab includes a 2021 extension built jointly with STMicroelectronics for MEMS and motion-control R&D.