Overview
Shanghai IC R&D Center (ICRD), established in December 2002 and approved as a national-level IC R&D center in May 2007, is a public R&D institute jointly invested by Chinese IC enterprise groups and universities. It operates an open 12-inch process R&D and equipment/materials pilot platform with more than 3,000 m2 of cleanroom, an 8-inch plus 12-inch tool platform, and complete 65-45nm process technology development capability. Key facility details include: The facility is situated at Pudong, Shanghai, China. It focuses on Logic / Foundry and 65, 45 process nodes on 300mm, 200mm wafers. Production at this facility commenced in 2002.
Technology
About Shanghai IC R&D Center (ICRD)
Shanghai IC R&D Center (ICRD) operates China's most advanced open-process 12-inch pilot line R&D platform, providing integrated circuit companies and research units with pre-research and process technology verification services.